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CSE Automatic electroless electroless equipment

Advantage

The wet process system is used for electroless aluminum plating, copper substrate material (Ni, Pd, Au)

(metal UBM under convex points)

Suitable for size to 300mm wafer

The longest service life benefits from the most advanced software and hardware

> maximum reliability and compatibility

Effective support for using Fraunhofer Technology

> maximum capacity

More bottomed production costs

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CSE fully automatic electroless electroless equipment (Hua Xuedu), design and Application

A wafer with a maximum high capacity diameter of 300mm, unique software and hardware guarantee

Long life and unrivalled low production costs.

The real-time analyzer and the optimized dosage of the process have excellent process control ability.

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Features and advantages

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application

Electroless aluminum and copper substrate materials (Ni, Pd, Au) (metal UBM under bump)

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General characteristics

> for a batch of 25 or 50 pieces of 100-200mm wafer, and a batch of 13 or 26 pieces of 300mm wafer.

> for standard high or low side flower baskets

Specially designed loading and unloading equipment used to transmit flower baskets

Washing machine grip

> two different mechanical hand claws, one for preprocessing, and the other for coating process

An independent exhaust gas that is safe and effective to discharge gases from acids, bases, neutrality and cyanide

Dry and dry process

Intelligent self rescue and emergency stop function of silicon wafer

> scheduler

> vibrating function of wafer

> dry

Cyanide detector and operator safety protection device

A sealed chemical supply tank

An automatic cleaning system for adjusting the temperature of each process

Lighting system that has no influence on the coating

> for clean room grade 10000 or higher clean room

> total automatic chemical ratio system:

Manually adjusting each different process and batch according to the difference of the product and the reaction time according to the needs

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Graphical user interface

> Windows interface

Edit menu

> real time flowchart

Auto save (EOR, ERR, ChemLog, etc.)

> multilevel cipher

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Process control ability

Real-time tracking of batch during the whole process

> process parameter tracking, including temperature, flow, resistivity

Concentration automatic control system

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Train

Operation, maintenance and process training

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General installation parameters

Dimensions: variable x 2150 x 3050 mm (L x D x H)

Line voltage: 3 x 400 VAC

Rated power: 50 Hz

Rated current: 3 x 100 A (etc.)

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standard

> FM 4910

> > SEMI S2 and S8

> > SECS/GEM

> CE

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Optional

> UPS component

> wafer ID recognition

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reliability

MTBF >: > 800 H

> auxiliary average interval: 300 H

Run time: > > 97%

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Now 400-8768-09618913575037 consulting can immediately free access to CSE CSE provides automatic electroplating equipment related programs

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